No/VOL: 09/2022 Page no. 235
Authors: Jan Gielzecki , Ryszard Mania , Konstanty Marszałek , Robert Wolanski :
Title: Deposition of Thin (Ti,Si)N Reflecive Layers on Textiles Substrates
Abstract: This paper describes the structure of the device and the method of applying thin (Ti,Si)N layers used as infrared radiation reflectors on fabrics. Ion magnetron sputtering at an average frequency MF (80 kHz) was used as the deposition method. Fabrics covered with thin layers are used for the production of clothes and elements of personal protective equipment dedicated to employees (emergency services, armed forces, metallurgy, mining and others) performing tasks in a hot microclimate environment.
Key words: personal protective equipment, special clothing, magnetron, thin layers.